Magnetron sputter deposition is a new type of physical vapor deposition that uses an electron emission electron gun system and focuses the plated material so that the atoms sputtered onto the target follow the principle of movement of motion from the target surface. Substrate deposition film with higher kinetic energy. Coated materials are called sputtering targets.
订阅：
博文评论 (Atom)
-
The corrosion form of titanium includes two categories: general corrosion and local corrosion: general corrosion is a form that is completel...
-
Titanium has many obvious superior characteristics: low density (4.5kg/m3), high melting point (1660°C), strong corrosion-resistance, high s...
-
Commonly used heat treatment methods for metal materials such as titanium alloys and titanium alloy plates are annealing, solution treatment...
没有评论:
发表评论