Target performance requirements

The target restricts the physical and mechanical properties of the sputtered film and affects the quality of the coating. Therefore, the target quality evaluation is relatively strict, and the following requirements should be met:

1) Low impurity content and high purity. The purity of the target material affects the uniformity of the film.

2) High density. The high-density target has the advantages of good electrical conductivity, good thermal conductivity, and high strength. Using this target for coating, the sputtering power is small, the film-forming rate is high, the film is not easy to crack, the Ti-Al Sputtering Target has a long service life, and the resistivity of the sputtered film is high. low, high transmittance.

3) The composition and structure are uniforms. The uniform target composition is an important guarantee for stable coating quality.

4) The grain size is small. The finer the grain size of the target, the more uniform the thickness distribution of the Titanium Sputtering Target, and the faster the sputtering rate. Because of the above-mentioned special requirements on the performance of the target, its preparation process is relatively complicated.